Antonio Facchetti, a distinguished materials scientist and chemist, has officially joined the faculty at the Hong Kong University of Science and Technology (HKUST). Facchetti moves to the institution from the Georgia Institute of Technology in the United States, where he held a prominent research profile. At HKUST, he will take on the role of chair professor within the university’s newly established department of materials.

Facchetti’s academic and professional background is marked by significant recognition in the field of electronics. In 2023, he was elected to the US National Academy of Engineering, an honor bestowed upon him for his work in developing commercially viable electronic materials and devices. His research expertise spans several critical areas of modern materials science, including semiconductors, dielectrics for thin-film applications, and related electronic technologies.

The appointment is part of a broader expansion at HKUST, which has recently focused on bolstering its research capabilities in materials science by creating a dedicated department. Facchetti’s move is viewed as a significant addition to the university's faculty, given his track record of bridging the gap between fundamental chemical research and practical, industrial applications in the electronics sector. While the move represents a major change for the researcher, both the university and Facchetti have framed the transition as a strategic opportunity to advance materials engineering research in the region.